Optimization of tool end-usage and process for proximity exposure on flex.

At TNO, Patterning for Flexible Systems

As an intern student you will be a team member of the “Patterning for flexible systems” group, you will optimize the use of a SUSS mask-aligner for the proximity exposure on polymer foil for flexible electronics applications. In addition, a new exposure process should be developed.

Your tasks and responsibilities include:

·         Literature research on the Mask aligner and other illumination techniques used in Lithography

·         Perform experiments in the cleanroom (substrate preparation, exposure, development)

·         Fine tuning of parameters

·         Characterize and evaluate the results

·         Participate in group meetings; provide feedback, discuss results and propose solutions

·         Write an experimental report and manual for the use of the new illumination system

 

Profile:

You are an ambitious master student with both scientific and practical skills. You have a chemical engineering or applied science background. You have good communication skills in English and you are independent but also a team player.

For all inquiries, please contact:

For more information contact: karin.tempelaars@tno.nl

Application form